Three-Dimensional Transient Electro-Thermal Interconnect Simulation for Stress and Electromigration Analysis

نویسندگان

  • S. Holzer
  • S. Selberherr
چکیده

We introduce the coupling of three-dimensional transient electro-thermal interconnect simulations with intrinsic thermo-mechanical stress solutions. In order to study the development of local thermal stresses we use a finite element simulator for the investigation of complex layered interconnect structures at different operating conditions. The obtained local stress, temperature distribution, the current density, and the potential distribution represent the complete input data for accurate electromigration analysis.

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تاریخ انتشار 2005